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Microchip lithography, the process of creating patterns on microchips using light, was initially developed in the United States in the mid-1950s. Specifically, Jay Lathrop and James Nall at Texas Instruments are credited with developing the technique, which they termed "photolithography," in 1958. The modern, high-volume chip manufacturing systems were primarily developed and commercialized by the Dutch company ASML.
Photolithography for microchip fabrication was inspired by the use of photoresist in etching metal, particularly in the aircraft industry.
Jay Lathrop and James Nall, engineers at Texas Instruments, pioneered the application of this technique to create transistors on germanium and later silicon. Their patent was approved in 1959. The first integrated circuits were used in military and aerospace applications, including the Apollo Guidance Computer.
ASML started as a joint venture between Philips and ASMI in 1984, initially developing lithography systems in a shed in Eindhoven. ASML developed advanced lithography systems, including the TWINSCAN system with dual-stage technology and, most notably, EUV (extreme ultraviolet) lithography. ASML has become the dominant player in the lithography market, particularly with its EUV systems, which are essential for producing the most advanced microchips.
